2D Material Cryo-Exfoliator

Product Description

The 2D Material Cryo-Exfoliator utilizes advanced cryogenic liquid nitrogen-assisted exfoliation technology. By precisely controlling thermal stress effects, it achieves high-efficiency exfoliation of 2D materials such as Graphene and TMDs. Integrating precision mechanical control with a cryogenic module, the system produces large-area, contamination-free thin-layer samples, significantly enhancing the R&D and fabrication efficiency of high-quality 2D heterostructures.

Core Technical Specifications

Temperature Range	LN2 Temperature to 200 °C
Heating Rate	40 °C/min
Cooling Rate	80 °C/min
Exfoliation Control	Motorized tape movement with controllable speed and angle
Control Interface	Windows software for speed and travel distance control
Others	Chamber supports nitrogen purging or vacuuming (KF16 interface)

Typical Application Areas

Physical exfoliation of high-quality 2D materials, large-area monolayer film preparation, thermal stress-assisted exfoliation research, micro-nano electronic device R&D, and cryogenic material characterization.